We Need To Talk About Electron Beam Lithography-Its A Game Changer

We Need To Talk About Electron Beam Lithography-Its A Game Changer

Yes Electron Beam Lithography is a real game changer. E Beam lithography is a process in which the focused beam of electrons are scanned to display the customary shapes on to a surface which is having a covering of an electron-sensitive film known as a resist.

EBL is a specialised technique for making the incredibly fine patterns needed by the modern electronics industry for integrated circuits. The electron bar has a frequency so little that diffraction no longer characterizes the lithographic goal. The resolution of e beam lithography is restricted by the wavelength of light used for exposure, while the resolution of optical lithography is restricted by the spot size of the electrons.

EBL is famous for a very unconventional technique of creating extremely small fine patterns which are then used in the production of integrated circuits. The lithography companies normally follow the principle related to photolithography. As the scanned beam of electrons focuses on the resistor, it tends to change the solubility properties for the energy which gets deposited with the electron beam.

However, the electron beam lithography is quite durable in creating high -resolute patterns, and some other extraordinary patterns for the production where processes such as the production of photomask take a lot of time.

As electrons are used for the formation of patterns through lithography. The patterns on the semiconductor would allow the electrical properties and other constituents that are required for the formation of a complete circuit. As the whole system is based on electrons, this is the reason why it is known as e beam lithography.


The method in which the early scanning electron microscopy involved scanning an electron beam through a surface filled with an electron sensitive resist film that stores energy in the desired pattern on the resist film. Some of the considerable ways are –

In optical lithography, there are two kinds of e-pillar opposes: positive tone and negative tone, with the typical conduct, that is, positive opposes grow away at uncovered areas, though on account of negative oppose the created locale stays after advancement.

Electron exposure modifies the resist until the casting fluid has been baked out. Polymers immersed in a liquid solvent are the most popular resists. To form a layer, the liquid resist is lowered onto the substrate, which is then spun at 1000 to 6000 pm.

The standard positive ebeam lithography resistor is polymethyl methacrylate (PMMA), which is usually purchased in two types of high molecular weight (495K or 950K) in a casting solvent such as chlorobenzene or anisole. The polymer breaks down into electron beam fragments, which we dissolve in a 1: 1 ratio in the MIBK: IPA developer.



  • Lithography companies are known for providing the highly resolute customary patterns that to be delivered on the resist.
  • For the production of high-resolution customized patterns, there is a need for an expensive amount of machines and tools. Therefore, to conduct this system is a little costlier.
  • E beam lithography resonates with less than 10nm of resolution power and the resolution done is highly reliable and accurate.
  • No requirement of using the photomask for conducting the resolution.
  • The electron source used by the system is Hot W/ZrO2. This helps in emitting the electrons effectively.
  • An electronic beam is induced with multiple layers of sensitivity for the process of diffusion or the production of secondary electronic platforms.
  • To avoid further charging effects, electrons are grounded safely. The process of grounding is done by adding a thin layer of aluminum or gold between the resistors.
  • Use of interference lithography with the electron beams is advantageous as it gives out the shorter wavelength for the same energy.
  • Multiple types of lithographic systems have been introduced in lithography companies covering the ionic beam and the electron beam technology but Electron Beam Lithography System has been considered the best from the rest. As it is known for the most practical way of concentrating the most energy into the smallest area. To enhance the development of multiple electron beam approaches towards lithography, a lot of companies are showing their interest in its installment. The companies are SEMTECH, Multibeam Corporation, Mapper, IMS Nanofabrication.
  • The introduction of Interference Lithography using the electron beams is another alternative path for patterning arrays with nanometer-scale periods. The advantage of using electrons over photons in interferometry is the shorter wavelength for the same energy.

 STS Elionix delivers nanotechnology products throughout North America and Europe. The Elionix e beam lithography (EBL) system is known for fulfilling the demands for the finest lines. Moreover, the company is known for its establishment of the world’s first 150Kv EBL system. This system is popular throughout the world.

To know more, kindly visit the website –  https://www.sts-elionix.com/